Physical Vapor Deposition

  A method of depositing thin semiconductor photovoltaic) films. With this method, physical processes, such as thermal evaporation or bombardment of ions, are used to deposit elemental semiconductor material on a substrate.

Energy terms . 2014.

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  • Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… …   Wikipedia

  • Physical vapor deposition — Physical vapor deposition. См. Осаждение из паровой фазы. (Источник: «Металлы и сплавы. Справочник.» Под редакцией Ю.П. Солнцева; НПО Профессионал , НПО Мир и семья ; Санкт Петербург, 2003 г.) …   Словарь металлургических терминов

  • physical vapor deposition — fizikinis garinis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. physical vapor deposition vok. physikalische Gasphasenabscheidung, f rus. физическое осаждение из паровой фазы, n pranc. déposition physique en phase vapeur, f;… …   Radioelektronikos terminų žodynas

  • Physical vapor deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… …   Deutsch Wikipedia

  • Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

  • Electron beam physical vapor deposition — Traduction à relire Electron beam physical vapor deposition → …   Wikipédia en Français

  • Vapor deposition — can refer to: * Chemical vapor deposition * Physical vapor deposition …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Chemical vapor deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… …   Deutsch Wikipedia

  • Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… …   Wikipedia

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